Bismuth-doped Ga2O3 as candidate for p-type transparent conducting material

Fernando P. Sabino,Xuefen Cai,Su-Huai Wei,Anderson Janotti

DOI: https://doi.org/10.48550/arXiv.1906.00840

2019-06-03

Abstract:Gallium oxide (Ga2O3) is a wide-band-gap semiconductor promising for UV sensors and high power transistor applications, with Baliga's figure of merit that far exceeds those of GaN and SiC, second only to diamond. Engineering its band structure through alloying will broaden its range of applications. Using hybrid density functional calculations we study the effects on adding Bi to Ga2O3. While in III-V semiconductors, such as GaAs and InAs, Bi tend to substitute on the pnictide site, we find that in Ga2O3, Bi prefers to substitute on the Ga site, resulting in dilute (Ga_{1-x}Bi_{x})2O3 alloys with unique electronic structure properties. Adding a few percent of Bi reduces the band gap of Ga2O3 by introducing an intermediate valence band that is significantly higher in energy than the valence band of the host material. This intermediate valence band is composed mainly of Bi 6s and O 2p orbitals, and it is sufficiently high in energy to provide opportunity for p-type doping.

Materials Science