Rapid photoreflectance spectroscopy for strained silicon metrology

H Chouaib,M E Murtagh,V Guènebaut,S Ward,P V Kelly,M Kennard,Y M Le Vaillant,M G Somekh,M C Pitter,S D Sharples
DOI: https://doi.org/10.1063/1.2999919
Abstract:We present an improved photoreflectance (PR) spectroscopy technique upon the prior art in providing a rapid acquisition method of the PR spectrum in a simultaneous and multiplexed manner. Rapid PR (RPR) application is the on-line monitoring of strained silicon. Shrinkage in the silicon bandgap is measured and converted to strain, using theoretical models. Experimental RPR results are in good correlation with Raman spectroscopy.
What problem does this paper attempt to address?