Abstract:Silicon-based optoelectronics, using the mature silicon-based microelectronic complementary metal oxide semiconductor (CMOS) manufacturing process, is a large-scale optoelectronic integration platform that has attracted much attention. Surface plasmonic devices have also received extensive attention in the past decades, and especially the silicon-based surface plasmonic nanofocusing devices have become a research hotspot. Typical nanofocusing structures include chirped surface gratings, plasmonic Fresnel zone plate, nano-slit array, tapered metal tips. However, there occur some inevitable problems in these devices, such as the fine structure being too complex to be fabricated and too large transmission loss of metal slot waveguide. In this work, an ultra-compact hybrid surface plasmon nanofocusing device is designed and fabricated by the silicon-based optoelectronic technology, and the nanofocusing performance of the device is also experimentally verified. The hybrid surface plasmon nanofocusing devices are fabricated on a silicon-on-insulator (SOI) wafer by electron beam lithography (EBL) system. The silicon wire waveguides, tapers and the thin silicon strips in the middle of nanofocusing regions are patterned in only one step EBL. The gold layer is formed by a deposition and lift-off process, and then a partially etching process is introduced to make the thickness of the middle thin silicon strips the same as that of the gold layer. With a 1.23-mu m-long tapered structure, our nanofocusing devices focus the light field of a silicon strip waveguide into a hybrid surface plasmon waveguide, making non-resonant optical field increase 20 times in the 1550 nm near-infrared band experimentally. The entire insertion loss is about 4.6 dB, and the mode area of the nanofocusing area is about (lambda/n)(2) / 6 40 which is over 300 times smaller than that of the input silicon waveguide. When the middle slot silicon waveguide width W-Si = 120 nm, the insertion loss reaches a minimum value of 2.8 dB. In our design, we adopt the design of silicon-based hybrid plasmonic waveguides. In this design, a layer of material with low refractive index is inserted between the metal layer and the silicon layer to act as a "container" of light field, which makes this silicon-based hybrid plasmonic waveguides have less loss than the traditional metal plasmonic waveguides, and can still maintain high optical field localization. Such silicon-based hybrid surface plasmon nanofocusing devices with simple structures and excellent performances are promising alternatives for future applications in optical field manipulation, optical sensing, nonlinear optical devices, and optical phase-change storage.

Laser-Driven Electron Lensing in Silicon Microstructures

Laser microstructuring of Si surfaces for low-threshold field-electron emission

Highly uniform silicon nanopatterning with deep-ultraviolet femtosecond pulses

Fabrication of Large-Area Concave Microlens Array on Silicon by Femtosecond Laser Micromachining

Laser nanofabrication inside silicon with spatial beam modulation and anisotropic seeding

Extreme Sub-Wavelength Structure Formation from Mid-IR Femtosecond Laser Interaction with Silicon

Subrelativistic Alternating Phase Focusing Dielectric Laser Accelerators

Laser nano-fabrication inside silicon with spatial beam modulation and non-local seeding

Laser-induced self-organized periodic nano-hole/nano-ridge structures on the surface of silicon produced with a tightly focused femtosecond pulse laser beam

Experimental research on ultracompact silicon hybrid plasmonic nanofocusing device

Laser micro/nano machining of silicon

In-chip microstructures and photonic devices fabricated by nonlinear laser lithography deep inside silicon

Photoinduced Multiple Microchannels Inside Silicon Produced by a Femtosecond Laser

Transverse Ultrafast Laser Inscription in Bulk Silicon

Silicon micro-structuring using ultra-short laser pulses

A thulium-silicon hybrid microdisk laser

Fabrication of Concave Spherical Microlenses on Silicon by Femtosecond Laser Irradiation and Mixed Acid Etching.

Study for Laser Controlled Fabrication of Micro/Nano-Structures of Silicon Based on Multi-Physics Model

Femtosecond Laser-Induced Mesoporous Structures on Silicon Surface

Formation of Array Microstructures on Silicon by Multibeam Interfered Femtosecond Laser Pulses