Long-term drift of Si-MOS quantum dots with intentional donor implants

Martin Rudolph,Bahman Sarabi,Roy Murray,Malcolm S. Carrol,Neil M. Zimmerman
DOI: https://doi.org/10.48550/arXiv.1801.07776
2018-01-24
Abstract:Charge noise can be detrimental to the operation of quantum dot (QD) based semiconductor qubits. We study the low-frequency charge noise by charge offset drift measurements for Si-MOS devices with intentionally implanted donors near the QDs. We show that the MOS system exhibits non-equilibrium drift characteristics in the form of transients and discrete jumps that are not dependent on the properties of the donor implants. The equilibrium charge noise indicates a $1/f$ noise dependence, and a noise strength as low as $1~\mathrm{\mu eV/\sqrt{Hz}}$, comparable to that reported in more model GaAs and Si/SiGe systems (which have also not been implanted). We demonstrate that implanted qubits, therefore, can be fabricated without detrimental effects on long-term drift or $1/f$ noise.
Mesoscale and Nanoscale Physics
What problem does this paper attempt to address?
The main problem that this paper attempts to solve is: **The influence of implanted donors on the low - frequency charge noise and its long - term drift characteristics in silicon metal - oxide - semiconductor (Si - MOS) quantum dot (QD) devices**. Specifically, the researchers are concerned with: 1. **The influence of low - frequency charge noise**: - Charge noise has an adverse effect on the operation of semiconductor qubits based on quantum dots. Research shows that this noise exhibits 1/f noise characteristics, that is, the low - frequency component dominates the dephasing process, thus affecting the fidelity of qubits. - The paper explores whether the low - frequency charge noise of these devices will change after donors are deliberately implanted in Si - MOS devices. 2. **Long - term drift characteristics**: - The researchers measured the long - term charge offset drift of Si - MOS devices with deliberately implanted donors to evaluate the stability of these devices on a long - time scale. - In particular, the influence of different numbers of implanted donors on the intensity of low - frequency charge noise was studied, as well as whether there are non - equilibrium characteristics such as transient relaxation and discrete jumps. 3. **The effect of implanted donors**: - The researchers hope to verify whether implanted donors will have an adverse effect on the long - term drift or 1/f noise of the device. This is very important for the development of donor - based qubits because these qubits exhibit extremely long coherence times. ### Main conclusions - **Non - equilibrium characteristics**: The study found that the MOS system exhibits non - equilibrium drift characteristics, such as transient relaxation and discrete jumps, but these characteristics are not related to donor implantation. - **1/f noise**: In the equilibrium state, the charge noise exhibits 1/f noise dependence, and the noise intensity is as low as 1 µeV/√Hz, which is comparable to the GaAs and Si/SiGe systems without implanted donors. - **The influence of implanted donors**: The results show that implanted donors do not significantly affect the long - term drift or 1/f noise characteristics, so qubits with implanted donors can be fabricated without affecting performance. Through these studies, the author has proved that implanted donors will not have an adverse effect on the low - frequency charge noise and long - term drift characteristics of Si - MOS devices, providing an important basis for further development of high - performance quantum computing devices. ### Formulas involved - **Transport current model**: \[ I(V,t)=I_0 + I_1V+A\sin\left[2\pi\left(\frac{C}{e}\right)(V + \Delta V(t))\right] \] where \( V \) is the gate voltage and \( C \) is the capacitance from the gate to the quantum dot. - **Coulomb blockade effect**: \[ I(V,t)=A\cosh^{-2}\left[B(V + \Delta V(t))\right] \] where \( E_C \) is the charging energy of the quantum dot. - **Charge - sensing measurement**: \[ I(V,t)=I_0 + I_1V+\frac{A}{1+\exp[B(V + \Delta V(t))]} \] - **Charge offset drift**: \[ \Delta Q_0(t)=\frac{e\Delta V_N(t)}{V_{N + 1}-V_N} \] - **Chemical potential drift**: \[ \Delta\mu_0(t)=-\alpha\Delta V_N(t) \] where \( \alpha \) is the gate lever arm with the unit of eV/V. These formulas are used to describe the charge offset drift and chemical potential drift measured in the experiment and help to explain the experimental results.