Interfacial energy barrier height of Al$_2$O$_3$/H-terminated (111) diamond heterointerface investigated by X-ray photoelectron spectroscopy

Aurélien Maréchal,Yukako Kato,Meiyong Liao,Satoshi Koizumi
DOI: https://doi.org/10.48550/arXiv.1703.01778
2017-03-06
Abstract:The interfacial band configuration of the high-k dielectric Al$_2$O$_3$ deposited at 120°C by atomic layer deposition (ALD) on boron- and phosphorus-doped hydrogen-terminated (111) diamond was investigated. Performing X-ray photoelectron spectroscopy measurements of core level binding energies and valence band maxima values, the valence band offsets of both heterojunctions are concluded to be {\Delta}E$_V$ = 1.8 eV and {\Delta}E$_V$ = 2.7 eV for the Al$_2$O$_3$/H(111)p and the Al$_2$O$_3$/H(111)n respectively. The ALD Al$_2$O$_3$ bandgap energy was measured from the O 1s photoelectron energy loss spectra to be $E_G^{ Al_2O_3}$ = 7.1 eV. The interfacial band diagram configuration is concluded to be of type II for both Al$_2$O$_3$/H(111)p and Al$_2$O$_3$/H(111)n heterostructures having conduction band offsets of {\Delta}E$_C$ = 0.2 eV and {\Delta}E$_C$ = 1.1 eV respectively. The use of doped (111) hydrogen-terminated diamond for developing future diamond MOSFET is discussed.
Materials Science
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