Three-dimensional nanoimprint lithography using two-photon lithography master samples

Rebecca Saive,Colton R. Bukowsky,Harry A. Atwater

DOI: https://doi.org/10.48550/arXiv.1702.04012

2017-02-14

Abstract:We demonstrate three-dimensional (3-D) nanoimprint lithography using master samples initially structured by two-photon lithography. Complex geometries like micro prisms, micro parabolic concentrators, micro lenses and other micrometer sized objects with nanoscale features are three-dimensionally fabricated using two-photon lithography. Stamps made out of polydimethylsiloxane are then cast using the two-photon lithographically structured samples as master samples. Hereby, expensive serial nano 3-D printing is transformed into scalable parallel 3-D nanoimprint lithography. Furthermore, the transition from two-photon lithography to imprint lithography increases the freedom in substrate and ink choice significantly. We demonstrate printing on textured surfaces as well as residue-free printing with silver ink using capillary action.

Mesoscale and Nanoscale Physics,Optics

What problem does this paper attempt to address?

The main problem that this paper attempts to solve is to improve the scalability and flexibility of three - dimensional nanostructure fabrication while maintaining high precision and the reproducibility of complex geometries. Specifically, the authors aim to combine the expensive and time - consuming two - photon lithography with the efficient nanoimprint lithography to achieve the following goals:

1. **Improve scalability**: Although two - photon lithography can fabricate complex three - dimensional nanostructures, its point - by - point scanning method results in a long fabrication time and is difficult to be applied on a large scale. By using the master fabricated by two - photon lithography for imprint lithography, the serial manufacturing process can be transformed into a parallel manufacturing process, thereby greatly improving production efficiency.

2. **Increase the freedom of substrate and ink selection**: Traditional two - photon lithography has high requirements for substrates, usually requiring smooth, non - reflective surfaces, and the selection of photoresists is also limited. Nanoimprint lithography, on the other hand, can be carried out on various substrates, including textured surfaces, and can use a variety of functional inks, such as silver inks.

3. **Achieve residue - free printing**: In nanoimprint lithography, the ink remaining between the printed features may interfere with the quality of the final structure. The authors show how to fill PDMS stamps by capillary action to achieve residue - free silver ink line printing.

### Specific solutions in the paper

- **Master preparation**: First, use two - photon lithography to fabricate masters with complex geometries, including micro - prisms, micro - parabolic concentrators, micro - lenses, etc.

- **Stamp making**: Then use polydimethylsiloxane (PDMS) to cast these masters to make stamps that can be used for imprinting.

- **Imprinting process**: Use PDMS stamps to imprint on different substrates to replicate three - dimensional nanostructures that are almost identical to the master.

- **Residue - free printing**: By filling the grooves in the stamps by capillary action, residue - free silver ink line printing is achieved, solving the common residue problem in the traditional imprinting process.

### Conclusion

By combining the advantages of two - photon lithography and nanoimprint lithography, the authors have successfully achieved large - scale, high - fidelity replication of complex three - dimensional nanostructures and can print on multiple substrates, significantly improving manufacturing efficiency and flexibility.