Versatile Post-Doping toward Two-Dimensional Semiconductors
Yuya Murai,Shaochun Zhang,Takato Hotta,Zheng Liu,Takahiko Endo,Hiroshi Shimizu,Yasumitsu Miyata,Toshifumi Irisawa,Yanlin Gao,Mina Maruyama,Susumu Okada,Hiroyuki Mogi,Tomohiro Sato,Shoji Yoshida,Hidemi Shigekawa,Takashi Taniguchi,Kenji Watanabe,Ruben Canton-Vitoria,Ryo Kitaura
DOI: https://doi.org/10.1021/acsnano.1c04584
IF: 17.1
2021-11-29
ACS Nano
Abstract:We have developed a simple and straightforward way to realize controlled postdoping toward 2D transition metal dichalcogenides (TMDs). The key idea is to use low-kinetic-energy dopant beams and a high-flux chalcogen beam simultaneously, leading to substitutional doping with controlled dopant densities. Atomic-resolution transmission electron microscopy has revealed that dopant atoms injected toward TMDs are incorporated substitutionally into the hexagonal framework of TMDs. The electronic properties of doped TMDs (Nb-doped WSe<sub>2</sub>) have shown drastic change and <i>p-</i>type action with more than 2 orders of magnitude increase in current. Position-selective doping has also been demonstrated by the postdoping toward TMDs with a patterned mask on the surface. The postdoping method developed in this work can be a versatile tool for 2D-based next-generation electronics in the future.
materials science, multidisciplinary,chemistry, physical,nanoscience & nanotechnology