Compensation of radiation damages for SOI pixel detector via tunneling

Miho Yamada,Yasuo Arai,Ikuo Kurachi
DOI: https://doi.org/10.1016/j.nima.2016.04.110
2015-07-14
Abstract:We are developing monolithic pixel detectors based on SOI technology for high energy physics, X-ray applications and so <a class="link-external link-http" href="http://on.To" rel="external noopener nofollow">this http URL</a> employ SOI pixel detector on such radiation environments, we have to solve effects of total ionizing dose (TID) for transistors which are enclosed in oxide <a class="link-external link-http" href="http://layer.The" rel="external noopener nofollow">this http URL</a> holes which are generated and trapped in the oxide layers after irradiation affect characteristics of near-by transistors due to its positive electric <a class="link-external link-http" href="http://field.Annealing" rel="external noopener nofollow">this http URL</a> and radiation of ultraviolet are not realistic to remove trapped holes for a fabricated detector due to thermal resistance of components and difficulty of handling. We studied compensation of TID effects by tunneling using a high-voltage. For decrease of trapped holes, applied high-voltage to buried p-well which is under oxide layer to inject the electrons into the oxide <a class="link-external link-http" href="http://layer.In" rel="external noopener nofollow">this http URL</a> this report, recent progress of this study is shown.
Instrumentation and Detectors
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