Abstract:Even when aberration-corrected electron microscopy is in the ascendant, the microstructural analysis of materials faces the problems of residual aberrations, zone-axis deviation, surface damage, and irradiation damage, which not only have kept the spatial resolution of the electron microscope at about 0.5 Å for years, but also limited the reliability and accuracy of the microstructural analysis. Electron ptychography is a computational imaging method that utilizes the rich information in four-dimensional scanning transmission electron microscopy datasets to obtain high spatial resolution, phase accuracy, and dose efficiency. Recently, the information limit of microscopic imaging has reached 0.14? by local-orbital ptychography. Electron ptychography consists of two stages: data acquisition and numerical reconstruction. In the data acquisition stage, a four-dimensional scanning transmission electron microscopy dataset is formed by recording the two-dimensional diffraction patterns at each position by means of a pixelated detector during the two-dimensional scanning of the electron beam on the sample. In the numerical reconstruction stage, the amplitude and phase of the sample are retrieved from these datasets by means of suitable algorithms. In contrast to aberration correction, which reduces the effect of lens aberrations on the imaging quality, electron ptychography eliminates this effect and achieves aberration-free imaging, reproducing the true structure of the sample nearly perfectly. We briefly introduce the basic principles and algorithms of electron ptychography from the perspective of the main problems faced by the microstructure analysis of materials, and introduce the main features of electron ptychography through application examples.

Local-orbital ptychography for ultrahigh-resolution imaging

Effect of spatial spectrum overlap on fourier ptychographic microscopy

Surface wave illumination Fourier ptychographic microscopy.

Three-dimensional Multi-Color Optical Nanoscopy at Sub-10-nm Resolution Based on Small-Molecule Organic Probes.

Electron ptychography of 2D materials to deep sub-ångström resolution

Introduction to Electron Ptychography for Materials Scientists

High-resolution 3D phase-contrast imaging beyond the depth of field limit via ptychographic multi-slice electron tomography

Deep sub-angstrom resolution imaging by electron ptychography with misorientation correction

High-quality imaging of large areas through path-difference ptychography

High-speed Fourier Ptychographic Microscopy for Quantitative Phase Imaging.

Information limit of 15 pm achieved with bright-field ptychography

Information Limit of 15 Picometers Achieved with Bright-Field Ptychography

Multi-Convergence-Angle Ptychography with Simultaneous Strong Contrast and High Resolution

Sub-nanometer depth resolution and single dopant visualization achieved by tilt-coupled multislice electron ptychography

Robust Ptychographic Reconstruction with an Out-of-Focus Electron Probe

Picometer-precision few-tilt ptychotomography of 2D materials

Atomic Resolution Defocused Electron Ptychography at Low Dose with a Fast, Direct Electron Detector

Reliable phase quantification in focused probe electron ptychography of thin materials

Cryogenic electron ptychographic single particle analysis with wide bandwidth information transfer

High-resolution ptychographic imaging at a seeded free-electron laser source using OAM beams

Near-Isotropic Sub-Ångstrom 3D Resolution Phase Contrast Imaging Achieved by End-to-End Ptychographic Electron Tomography