At‐wavelength metrology of an X‐ray mirror using a downstream wavefront modulator

Tunhe Zhou,Lingfei Hu,Hongchang Wang
DOI: https://doi.org/10.1107/s1600577524002157
IF: 2.557
2024-04-10
Journal of Synchrotron Radiation
Abstract:An iterative method to accurately map wavefront slope measurements from a downstream wavefront random modulator to a curved X‐ray mirror surface is presented, addressing a significant challenge in at‐wavelength metrology. The results show a substantial improvement over conventional approaches, enhancing the precision of at‐wavelength metrology techniques for improved beamline operations.At‐wavelength metrology of X‐ray optics plays a crucial role in evaluating the performance of optics under actual beamline operating conditions, enabling in situ diagnostics and optimization. Techniques utilizing a wavefront random modulator have gained increasing attention in recent years. However, accurately mapping the measured wavefront slope to a curved X‐ray mirror surface when the modulator is downstream of the mirror has posed a challenge. To address this problem, an iterative method has been developed in this study. The results demonstrate a significant improvement compared with conventional approaches and agree with offline measurements obtained from optical metrology. We believe that the proposed method enhances the accuracy of at‐wavelength metrology techniques, and empowers them to play a greater role in beamline operation and optics fabrication.
optics,physics, applied,instruments & instrumentation
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