Abstract:Glass ceramic (GC) is the most promising material for objective lenses for extreme ultraviolet lithography that must meet the subnanometer precision, which is characterized by low values of high spatial frequency surface roughness (HSFR). However, the HSFR of GC is typically degraded during ion beam figuring (IBF). Herein, a developed method for constructing molecular dynamics (MD) models of GC was presented, and the formation mechanisms of surface morphologies were investigated. The results indicated that the generation of the dot-like microstructure was the result of the difference in the erosion rate caused by the difference in the intrinsic properties between ceramic phases (CPs) and glass phases (GPs). Further, the difference in the microstructure of the IBF surface under different beam angles was mainly caused by the difference in the two types of sputtering. Quantum mechanical calculations showed that the presence of interstitial atoms would result in electron rearrangement and that the electron localization can lead to a reduction in CP stability. To obtain a homogeneous surface, the effects of beam parameters on the heterogeneous surface were systematically investigated based on the proposed MD model. Then, a novel ion beam modification (IBM) method was proposed and demonstrated by TEM and GIXRD. The range of ion beam smoothing parameters that could effectively converge the HSFR of the modified surface was determined through numerous experiments. Using the optimized beam parameters, an ultrathin homogeneous modified surface within 3 nm was obtained. The HSFR of GC smoothed by ion beam modification-assisted smoothing (IBMS) dropped from 0.348 to 0.090 nm, a 74% reduction. These research results offer a deeper understanding of the morphology formation mechanisms of the GC surfaces involved in ion beam processing and may point to a new approach for achieving ultrasmooth heterostructure surfaces down to the subnanometer scale.

Ion beam shaping and downsizing of nanostructures

Ion beam sputtering method for progressive reduction of nanostructures dimensions

Study of Negative Side Wall Surface Roughness by Picosecond Photonic Impact Microdeposition

Composition Control of Electron Beam Induced Nanodeposits by Surface Pretreatment and Beam Focusing

Controllable Shrinking and Shaping of Silicon Nitride Nanopores under Electron Irradiation

Shaping single walled nanotubes

Controlled thinning and surface smoothening of silicon nanopillars

A new system for sample synthesis, preparation and modification combined with in-situ depth profiling using medium energy ions

Nanostructured Surfaces from Size-Selected Clusters

Suppressing of Secondary Electron Diffusion for High-Precision Nanofabrication

Nonlinear Effects of Pulsed Ion Beam in Ultra-High Resolution Material Removal

Shrinking solid-state nanopores using electron-beam-induced deposition

Smoothing and cleaning effects on substrate surface by gas cluster ion beam

Nanoscale reshaping of resonant dielectric microstructures by light-driven explosions

Subnanoscale Ion Beam Modification-Assisted Smoothing of Heterostructure Surfaces

Fabrication Of Ultrafine Nanostructures With Single-Nanometre Precision In A High-Resolution Transmission Electron Microscope

Controllable fabrication of Sub-20nm structures with coupling field tip enhancement effect induced by nanosecond pulsed laser irradiation

Study on an Effective One-Dimensional Ion-Beam Figuring Method.

Advanced Ion Column Solution for Low Ion Damage Characterization and Ultra-Fine Process

Study of surface morphology of Ag thin films prepared by sputtering and irradiation with keV Ar ion beam

Ion microscopy based on laser-cooled cesium atoms