Abstract:major reason for this is that EBID depends not only on the electron beam conditions but also on the surface concentration of contaminating hydrocarbons. [ 1,28 ] More seriously, it is hard to quantify this concentration, although we know that the hydrocarbons mainly come from either impurities in the TEM column or from adsorption on the specimen surface, or from both. Hence, it is very diffi cult to realize controllable nanofabrications by EBIS or EBID to date. Here in an attempt to describe the relationship between EBIS and EBID, nanopores in a graphene membrane or carbon nanodots on its surface were fabricated by focused electron beam (diameter smaller than 10 nm) with various current densities or irradiation time. It is found that EBIS is signifi cant when the current density is larger than 500 A/cm 2 , while EBID begins to dominate when the current density is less than 300 A/cm 2 . A simplifi ed model has been proposed to explain the experiments quantitatively. We believe that our results have signifi cance in the fabrication of carbon nanostructures, and also provide an effective way to fabricate nanofl uidics and nanoelectronics. Figure 1 a–c demonstrates a typical sputtering process induced by a high intensity focused electron beam on a graphene membrane. Figure 1 a shows a region of pristine graphene before electron irradiation with the circle denoting the region which was exposed to the electron beam. The current density was ∼2.0 × 10 3 A/cm 2 . Figure 1 b shows the same region after 20 s of electron irradiation. The exposed area is clearly altered and shows obvious damage to the membrane confi rmed by disordered structures. Another 28 seconds later, as shown in Figure 1 c, a nanopore has been formed at the center of the irradiation region, where the electron beam current density is higher. It is noted that there is a damaged region between the pore and the pristine graphene. These can be understood from the common assumption that the amount of irradiation damage is proportional to the accumulated irradiation dose. To further understand the sputtering process, we recorded the relationship between nanopore diameter and irradiation time by drilling tens of nanopores using the same beam conditions. Figure 1 d shows the size of graphene nanopores as a function of irradiation time. The electron beam used in Figure 1 d is shown in Figure 1 e. It has a typical Gaussian intensity distribution with a full width at half maximum of 5 nm and a maximum density of ∼ 4.3 × 10 3 A/cm 2 at the center (Figure S1). The thickness of graphene, which had been determined by imaging the edge of the nanopores, was ∼1.7 nm (5 layers). As shown in Figure 1 d, longer the Nanostructures

Composition Control of Electron Beam Induced Nanodeposits by Surface Pretreatment and Beam Focusing

Self-marked preparation of site-specific transmission electron microscope lamellae of nanodevices using focusing ion beam technique.

Pioneering preparation and analysis of a clean surface on a microcrystal, mined by a focused ion beam

Nanoscale Material Design and Processing by Electron Beam Energy

Effects Associated with Nanostructure Fabrication Using In Situ Liquid Cell TEM Technology

Charged Particle-Induced Surface Reactions of Organometallic Complexes as a Guide to Precursor Design for Electron- and Ion-Induced Deposition of Nanostructures

Electron beam deposition for nanofabrication: Insights from surface science

Application of the Focused-Ion-Beam Technique for Preparing the Cross-Sectional Sample of Chemical Vapor Deposition Diamond Thin Film for High-Resolution Transmission Electron Microscope Observation

Analyzing Nanogranularity of Focused Electron-Beam-Induced Deposited (FEBID) Materials by Electron Tomography

Fabrication Of Ultrafine Nanostructures With Single-Nanometre Precision In A High-Resolution Transmission Electron Microscope

Study on nanostructures induced by high-current pulsed electron beam

Exploring the fabrication and transfer mechanism of metallic nanostructures on carbon nanomembranes via focused electron beam induced processing

Surface Modification of Metals Irradiated by Intense Nanosecond Pulsed Electron Beam

Controllable atomic-scale sculpting and deposition of carbon nanostructures on graphene.

Electron-beam induced synthesis of nanostructures: a review

Focused, Nanoscale Electron-Beam-Induced Deposition and Etching

Nanostructures of ITO Thin Films Induced by Low Energy Ion Beam

Mechanism-based design of precursors for focused electron beam-induced deposition

Exploring the influence of focused ion beam processing and scanning electron microscopy imaging on solid-state electrolytes

Nanostructuring of Semiconductor Materials and Metallic Thin Films Using Femtosecond Laser and Scanning Probe Microscope

Control of Nanoscale Interphase Boundaries by an Electron Beam