A facile solution processible self-rectifying and sub-1 V operating memristor via oxygen vacancy gradient within TiO2 single layer

Min Ho Park,Jun Hyung Jeong,Wonsik Kim,Soohyung Park,Byeong Min Lim,Hong-Sub Lee,Seong Jun Kang
DOI: https://doi.org/10.1039/d4tc00227j
IF: 6.4
2024-04-17
Journal of Materials Chemistry C
Abstract:Memristors are becoming increasingly recognized as candidates for neuromorphic devices due to their low power consumption, non-volatile memory, synaptic properties, and the ease of parallel computing through crossbar arrays. However, sneak current is a critical obstacle in crossbar arrays, and much research is being conducted to suppress sneak current through self-rectifying characteristics. Here, we present a highly straightforward method for fabricating active layer of self-rectifying memristor through a single spin coating process, capitalizing on the attributes of spin coating, which initiates the reaction from the upper portion of the solution. We fabricated a self-rectifying memristor using an Ag/TiO2/TiOx/ITO structure through a vacuum-free solution process to achieve low-cost. During the spin-coating process, the reaction between titanium isopropoxide (TTIP) and ambient moisture formed TiO2 with an oxygen vacancy gradient. We confirmed the natural oxygen vacancy gradient using X-ray photoelectron spectroscopy (XPS) depth profiling and elucidated the resistance switching and self-rectifying mechanisms of the memristor based on the energy band structure. The memristors exhibited resistance switching and self-rectifying characteristics, which were an essential characteristic for preventing sneak currents in a 3 × 3 crossbar array structure.
materials science, multidisciplinary,physics, applied
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