CONSTRUCTION AND ACCURACY TEST OF A NOVEL HETERODYNE GRATING INTERFEROMTER SYSTEM FOR TWO-DIMENSIONAL DISPLACEMENT MEASUREMENT

Lei Wang,Ming Zhang,Yu Zhu,Y. F. Wu,Chuxiong Hu,Zhao Liu
2014-01-01
Abstract:INTRODUCTION We aim to improve the displacement measurement accuracy of the wafer stage in the lithography scanner [1-2], by means of a novel environmental robustness heterodyne grating interferometer system for two-dimensional displacement measurement. Former work of interferometry based homodyne grating encoders which could simultaneously measure multi-dimensional displacement has been demonstrated [3-4]. Nevertheless, these proposed encoders have bad measurement accuracy and complicated setup by the reason of adopting homodyne detection scheme, which limit its application in the wafer stage. This paper describes the construction and accuracy test of a novel heterodyne grating interferometer system which can simultaneously measure a long stroke with hundreds of millimeters in the in-plane direction and a short stroke with hundreds of micrometers in the outof-plane direction. First accuracy test results show that the measurement standard deviation is 6.37nm in the in-plane direction, and is 3.69nm in the out-of-plane direction.
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