Selective Etching of ITO-PET using Dry Film Photoresist for Large Area Metamaterial Fabrication

Sudeb Bhattacharya,Kajal Chaudhary,Aakash Aakash,Ramkumar Janakarajan,Kumar Vaibhav Srivastava
DOI: https://doi.org/10.1039/d4tc02547d
IF: 6.4
2024-10-12
Journal of Materials Chemistry C
Abstract:The selective etching of Indium Tin Oxide (ITO) from the polymer substrate to fabricate rapidly growing flexible electronic devices over large area is extremely challenging. We developed a wet etching technique for removal of the ITO films coated over Polyethylene Terephthalate (PET) substrates, by employing uniformly coated dry film photoresist (DFPR) and optimized the photolithographic process that is easily scalable for industrial manufacturing units. The substrate was exposed to minimum heat during lamination of DFPR and the chemical etchant, aqua regia with optimal dilution was used to selectively remove the ITO film without any degradation of underlying PET. UV-Vis, SEM and 4-probe conductivity measurements have shown that the electrical conductivity and optical transparency of the samples were maintained after exposure to optimized composition of chemicals during etching, developing and stripping processes. The fabrication of X-band FSS based RADAR absorber comprised of repetitive conductive patterns of ITO films over PET substrate has been demonstrated for approximately unit square feet sample size. The simulated EM performance of the FSS, absorbing more than 90\% of EM waves within the frequency range of 7.6-12.2 GHz was validated by measurements conducted in anechoic chamber.
materials science, multidisciplinary,physics, applied
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