Engineering of core@double-shell Si@SiO 2 @PS particles towards improved dielectric performances: Filler domain-type polarization mechanism in PVDF composites

Weiwei Peng,Wenying Zhou,Yanqing Zhang,Hongmei Niu,Xinbo Dong,Guangheng Wang,Huiwu Cai,Xiangrong Liu,Mengxue Yuan
DOI: https://doi.org/10.1016/j.compositesa.2023.107548
2023-04-07
Abstract:To concurrently improve both the dielectric constants ( ε ) and breakdown strength ( E b ), and restrain the loss of original Si (silicon)/poly(vinylidene fluoride, PVDF), herein, we prepared the structured 2 (silica)@PS(polystyrene)/PVDF composites. The dielectric properties of composites were investigated in terms of various fillers and frequency, and polarization mechanism was examined by fitting the Havriliak-Negami expression. The results verify that the polarization in Si/PVDF is governed by electron transport via multiple adjacent fillers, i.e., essentially a domain-type polarization. The particles affect the dielectric properties of composites by fundamentally changing the filler-cluster size. The 2 @PS/PVDF shows both high-ɛ and E b owe to amplified filler-cluster size and significantly suppressed loss due to inhibited charge carrier migration synchronously. Both the filler design strategy and filler domain-type polarization mechanism provide helpful insights into the development of percolating composites with high ε and E b but low loss for promising applications.
materials science, composites,engineering, manufacturing
What problem does this paper attempt to address?