Thermal expansion coefficient of Cu-Al2O3 nanocomposites by molecular dynamics simulation

Shenghong Ju,Tianyu Zhang,Wenkai Liu
DOI: https://doi.org/10.1109/ICEPT56209.2022.9873184
2022-08-10
Abstract:Through Silicon Via (TSV) technology is one of the mainstream 3D packaging technologies, which can improve the speed and reduce the power consumption of the chip. However, with the increasing of interconnection density, due to the mismatch between the thermal expansion coefficient (CTE) of TSV and the substrate, great thermal mechanical stress will be generated in and around the TSV during the thermal cycle manufacturing process, leading to different kinds of quality and reliability problems. In this work, the CTE of Cu-Al2O3 nanocomposites has been comprehensively investigated by using the molecular dynamics simulation. Increasing the mass fraction of Al2O3 in Cu-Al2O3 nanocomposites decreases the CTE. The uniform distribution doping has larger interfacial area, thus enhancing the binding force on matrix deformation and reducing the CTE of Cu-Al2O3 nanocomposites. Cubic particles doping has a lower CTE than spherical particles. Those results provide new insights for the Cu-filled TSV materials and application.
Engineering,Physics,Materials Science
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