Stability analysis of a viscoelastic model for ion-irradiated silicon

Scott A. Norris
DOI: https://doi.org/10.1103/physrevb.85.155325
IF: 3.7
2012-04-27
Physical Review B
Abstract:Recently, elastic stress has been among several mechanisms hypothesized to induce the formation of ordered structures in Si irradiated at normal incidence by energetic ions. To test this hypothesis, we model the thin amorphous film atop ion-irradiated Si as a viscoelastic continuum into which the ion beam continually injects biaxial compressive stress. We find that at normal incidence, the model predicts a steady compressive stress of a magnitude comparable to experiment and molecular dynamics simulation. However, linear stability analysis at normal incidence reveals that this mechanism of stress generation is unconditionally stabilizing due to a purely kinematic material flow, depending on none of the material parameters. Thus, despite plausible conjectures in the literature as to its potential role in pattern formation, we conclude that compressive stress induced by normal-incidence ion bombardment is unlikely to be a source of instability at any energy. In fact, with this result, all hypothesized mechanisms suggested to explain structures on pure materials under normal incidence irradiation have now been overturned, supporting recent theories attributing hexagonal ordered dots to the effects of composition. In addition to this result, we find that the elastic moduli appear in neither the steady film stress nor the leading-order smoothening, suggesting that the primary effects of stress can be captured even if elasticity is neglected. This supports the basic framework recently adopted by other authors and should allow future analytical studies of highly nonplanar surface evolution, in which the beam-injected stress is considered to be an important effect.
physics, condensed matter, applied,materials science, multidisciplinary
What problem does this paper attempt to address?