Influence of sapphire substrate with miscut angles on hexagonal boron nitride films grown by halide vapor phase epitaxy

Minghao Chen,Qian Zhang,Chunlei Fang,Zhijie Shen,Yong Lu,Ting Liu,Shuxin Tan,Jicai Zhang
DOI: https://doi.org/10.1039/d3ce00528c
IF: 3.756
2023-01-01
CrystEngComm
Abstract:(002) hexagonal boron nitride (h-BN) micron films were epitaxially grown on c -plane sapphire substrates with miscut angles to m -plane ( m -miscut angle) by high-temperature and low-pressure halide vapor phase epitaxy.
chemistry, multidisciplinary,crystallography
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