An OLED display fabricated through side‐by‐side pixel patterning via photolithography
Shingo Eguchi,Sho Kato,Takayuki Oide,Akihiro Chida,Koji Kusunoki,Yasumasa Yamane,Satoru Idojiri,Yasutaka Nakazawa,Kenichi Okazaki,Shunpei Yamazaki
DOI: https://doi.org/10.1002/jsid.2019
2024-11-23
Journal of the Society for Information Display
Abstract:MML is technology to form patterned OLED element on each pixel by using photo‐lithography process. It enables to achieve ultra‐high resolution (over 1000 ppi) across all red‐blue‐green pixels of an organic light‐emitting diode (OLED) display without using a fine metal mask. We developed a patterning technology using photolithography that eliminates the need for a fine metal mask, thereby achieving high resolution across all red‐blue‐green pixels of an organic light‐emitting diode (OLED) display. Traditional methods using fine metal masks typically restrict the resolution and size of a display. However, the proposed technology largely bypasses these constraints. Suitable for OLED applications ranging from microdisplays in augmented reality and virtual reality to large TVs exceeding 80 in., our technology overcomes limitations on alignment accuracy, fine metal mask washing, and running costs and paves the way for mass production in OLED manufacturing.
engineering, electrical & electronic,materials science, multidisciplinary,optics,physics, applied