Abstract:Surfaces of metal oxides are of crucial importance for a variety of technological applications such as heterogeneous catalysis, thin film growth, gas sensing, and corrosion prevention [1]. Due to the complexities of oxides in crystal structure and electronic structure, however, the surface science of oxides lags far behind that of metals or semiconductors. Conventional surface-science techniques, typically scanning tunneling microscopy (STM) and low energy electron diffraction (LEED), are usually limited to surfaces of single crystals with relatively simple structures. Metal oxides are usually good insulators, either band insulators or Mott insulators, making them not suitable for STM, LEED, and most of spectroscopic methods using low energy electrons as probes. On the other hand, the complex atomic structures of oxides results in too many structural parameters to be determined by spectroscopy or diffraction methods. Recent developments in high-resolution transmission electron microscopy (TEM) provide us opportunities to overcome the above difficulties. With the realization of aberration-correction, the point resolution of TEM has been improved into the milestone 1 Angstrom scale. In addition, the correction of the spherical aberration has almost eliminated the contrast delocalization in high-resolution images. Therefore, high resolution TEM becomes an even more powerful tool than before for materials research at a truly atomic-scale. Here, we will present our recent works on atomic and electronic structure of oxide surfaces [2-3]. We will show that the structure and dynamics of oxide surfaces can be directly imaged and measured at the sub-angstrom scale with an accuracy of picometers, comparable to that obtained by conventional surface science techniques on single crystals.

In situ Auger electron spectroscopy of complex oxide surfaces grown by pulsed laser deposition

In Situ Monitoring of Composition and Sensitivity to Growth Parameters of Pulsed Laser Deposition

Imaging Pulsed Laser Deposition oxide growth by in-situ Atomic Force Microscopy

Pulsed laser deposition with simultaneous in situ real-time monitoring of optical spectroscopic ellipsometry and reflection high-energy electron diffraction

Recent Advances in Mechanism Investigation of Atomic Layer Deposition by in Situ Photoelectron Spectroscopy

Recent advances in pulsed-laser deposition of complex-oxides

Direct Observation and Control of Surface Termination in Perovskite Oxide Heterostructures

Stoichiometry control of complex oxides by sequential pulsed-laser deposition from binary-oxide targets

Complex oxide growth using simultaneous in situ RHEED and x-ray reflectivity: When is one layer complete?

In Situ X-Ray Photoelectron Spectroscopy Analysis of the Atomic Layer Deposition of Al2O3 on SiO X /si: Interface Dipole and Persistent Surface Groups

In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu2O3

Probing Emergent Surface and Interfacial Properties in Complex Oxides via in situ X-ray Photoelectron Spectroscopy

Glow discharge-optical emission spectroscopy for in situ analysis of surfaces in plasmas

In situ XRD measurements to explore phase formation in the near surface region

In-situ quantification of the surface roughness for facile fabrications of atomically smooth thin films

Pulsed Laser Deposition of Large-Sized Superlattice Films with High Uniformity.

Direct Atomic Imaging of Oxide Surfaces

UV radiation enhanced oxygen vacancy formation caused by the PLD plasma plume

Auger Electron Spectroscopy of Surfaces During Exposure to Gaseous Discharges

Optical Identification of Materials Transformations in Oxide Thin Films

In situ engineering and characterization on the artificial heterostructures of correlated materials with integrated OMBE–ARPES