Underwater Superoleophobic Surface Based on Silica Hierarchical Cylinder Arrays with a Low Aspect Ratio

Wendong Liu,Siyuan Xiang,Xueyao Liu,Bai Yang
DOI: https://doi.org/10.1021/acsnano.0c04670
IF: 17.1
2020-07-09
ACS Nano
Abstract:A superantiwetting surface based on low-aspect-ratio hierarchical cylinder arrays (HCAs) was successfully obtained on a silica substrate by colloidal lithography with photolithography. Colloidal lithography is a technique involving transfer of a pattern to a substrate by etching or exposure to a radiation source through a mask composed of a packed colloidal crystal, while photolithography is utilized by which a pattern is transferred photographically to a photoresist-coated substrate, and the substrate is subsequently etched. The surface provides an alternative approach to apply aligned micro-nano integrated structures with a relatively low aspect ratio in superantiwetting. The obtained HCAs successfully integrated micro- and nanoscale structures into one system, and the physical structure of the HCAs can be tuned by modulating the fabrication approach. Using a postmodification process, the underwater–oil wetting behavior of cylinder-array based surfaces can be easily modulated from the superoleophobic state (an oil contact angle (OCA) of 161°) to oleophilic state (an OCA of 19°). Moreover, the underwater–oil wettability can be reversibly transformed from the superoleophobic state (an OCA of approximately 153°) into the oleophilic state (an OCA of approximately 31°) by grafting stimuli-responsive polymer (PNIPAAm) brushes onto this specific hierarchical structure. Due to the temperature-responsive property, modifying the surface with PNIPAAm provides a possibility to control the oil wettability (repellent or sticky) by temperature, which will benefit the use of HCAs in oil–water separation and other application fields.This article has not yet been cited by other publications.
materials science, multidisciplinary,chemistry, physical,nanoscience & nanotechnology
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