Abstract:Silicon dioxide (SiO 2 ) is a prominent candidate for radiative cooling applications due to its low absorption in solar wavelengths (0.25–2.5 μm) and exceptional stability. However, its bulk phonon-polariton band results in a strong reflection peak in the atmospheric transparency window (8–13 μm), making it difficult to meet the requirements for sub-ambient passive radiative cooling. Herein, we demonstrate that SiO 2 micropillar arrays can effectively suppress infrared reflection at 8–13 μm and enhance the infrared emissivity by optimizing the micropillar array structure. We created a pattern with a height, spacing, and diameter of approximately 1.45 μm, 0.15 μm, and 0.35 μm, respectively, on top of a bulk SiO 2 substrate using reactive ion etching. The resulting surface phonon coupling of the micropillar array led to an increase in the thermal emissivity from 0.79 to 0.94. Outdoor tests show that the SiO 2 cooler with an optimized micropillar array can generate an average temperature drop of 5.5 °C throughout the daytime underneath an irradiance of 843.1 W m −2 at noon. Furthermore, the micropillar arrays endow the SiO 2 cooler with remarkable hydrophobic properties, attributed to the formation of F/C compounds introduced during the etching process. Finally, we also replicated the micropillar pattern onto the surface of industrial optical solar reflectors (OSRs), demonstrating similar emissivity and hydrophobicity enhancements. Our findings revealed an effective strategy for modifying the thermal management features of durable SiO 2 layers, which can be harnessed to cool OSRs and other similar sky-facing devices.

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