Influence of interfacial configuration on superhardness effect in TiN (111)/NbN (111) nano-multilayer film: A first-principles calculation

Chao Lu,Fanwei Meng,Huan Liu,Xuanwei Lei,Jian Yang,Jihua Huang,Shuhai Chen,Zheng Ye,Yue Zhao
DOI: https://doi.org/10.1016/j.mtcomm.2020.101238
IF: 3.8
2020-09-01
Materials Today Communications
Abstract:<p>Interfacial configuration effect on the superhardness effect in TiN (111)/NbN (111) nano-multilayer film was investigated using first-principles calculations. The TiN (111)/NbN (111) interfaces with N–Nb terminated structure and different stacking sequences (including Top, SL and TL) were selected as main research object from the twelve constructed TiN (111)/NbN (111) interfaces because of the strongest bonding strength. During the ideal tensile process, the fractures of interfaces with Top, SL and TL stacking sequences are all within NbN interior, confirming the existence of superhardness effect. The generalized stacking fault energy of Top stacking sequence is the lowest, which indicates it shows the highest dislocation density at/near interface and the largest local crystal strength, resulting in the strongest superhardness effect, and followed by SL and TL stacking sequences. The dominant factor to influence superhardness effect in TiN (111)/NbN (111) nano-multilayer film is the interfacial configuration, the interface which breaks the continuous NaCl structure shows the strongest superhardness effect. The secondary factor to influence superhardness effect is the interfacial bonding behavior. For interface with similar interfacial configuration, the ionic characteristic at the interface plays the positive role in influencing the superhardness effect, while the influence from covalent characteristic can be ignored.</p>
materials science, multidisciplinary
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