Role of mechanically-driven distorted microstructure in mechanochemical removal of silicon

Chen Xiao,Jie Li,Jian Guo,Peng Zhang,Bingjun Yu,Lei Chen,Linmao Qian

DOI: https://doi.org/10.1016/j.apsusc.2020.146337

IF: 6.7

2020-08-01

Applied Surface Science

Abstract:<p>Ultra-precision of nanomanufacturing process down to subnanometer level is actually to achieve controllable removal of atomic material, however, which would be strongly impacted by the preconditions of manufactured surfaces. Here, the atomic structures, chemical and mechanical properties of mechanically-driven distorted microstructures on silicon formed in pre-treated process were characterized and their roles in atomic attrition dominated by mechanochemical reactions were revealed at atomic scale. Mechanically deformed silicon depending on applied stress physically behaviors protrusion forming and material removal (groove), which play opposite contributions to the mechanochemical reactions, i.e., atomic attrition suppressed on the protrusion surface but facilitated on the groove surface. Analyzing the mechanochemical reactions with the stress-assisted Arrhenius-type kinetics model and the DMT contact mechanics implies that, compared to the limited effect of the amorphous structure, the enhanced oxide layer at the protrusion surface that increases the energy barrier for mechanochemical reactions plays a more important role in the mechanochemical removal process. The results may help gain a profound insight into the mechanochemical removal mechanism of silicon and provide a wider cognition for regulating the mechanochemical reactions widely existing in scientific and engineering applications.</p>

chemistry, physical,physics, applied, condensed matter,materials science, coatings & films

What problem does this paper attempt to address?

The problem that this paper attempts to solve is the influence of machining history on the mechanochemical removal of silicon surfaces during the nanofabrication process. Specifically, the research focuses on how the mechanically - driven distorted microstructures formed during the pretreatment process affect the atomic - level removal process of silicon materials. By studying the role of these microstructures in mechanochemical reactions, the paper aims to gain a deep understanding of the mechanochemical removal mechanism of silicon materials and provide a broader understanding for regulating mechanochemical reactions widely existing in scientific and engineering applications. The paper mentions that the ultra - precision nanofabrication process requires controllable atomic material removal, but this process is strongly influenced by the pre - conditions of the manufacturing surface. By characterizing the atomic structure, chemistry, and mechanical properties of mechanically - driven distorted microstructures, the researchers revealed the role of these structures in atomic wear dominated by mechanochemical reactions. The study found that mechanically - deformed silicon exhibits two behaviors under applied stress: protrusion formation and material removal (grooving), and these two behaviors have opposite effects on mechanochemical reactions, that is, the protrusion surface inhibits atomic wear, while the grooving surface promotes atomic wear. Through the analysis of the stress - assisted Arrhenius - type kinetic model and the DMT contact mechanics model, the study pointed out that, compared with the limited effect of the amorphous structure, the thickened oxide layer on the protrusion surface increases the energy barrier of mechanochemical reactions and plays a more important role in the mechanochemical removal process. These results are helpful for in - depth understanding of the mechanochemical removal mechanism of silicon and provide new knowledge for regulating mechanochemical reactions, which is of great significance for ultra - precision manufacturing in high - tech applications.

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