Re-touch rebound patterns and contact time for a droplet impacting a superhydrophobic cylinder
Ling-Zhe Zhang,Yi-Bo Wang,Shu-Rong Gao,Dian-Ji Lin,Yan-Ru Yang,Xiao-Dong Wang,Duu-Jong Lee
DOI: https://doi.org/10.1016/j.jtice.2021.07.012
IF: 5.477
2021-09-01
Journal of the Taiwan Institute of Chemical Engineers
Abstract:Droplet rebound dynamics from a superhydrophobic cylinder was studied numerically.Contact time differs from that on a flat surface, increases once re-touch takes place.Dependence of rebound patterns and τc are characterized and discussed.Power-law correlations of τc vs α are developed for bouncing.Method is proposed to suppress and prevent the re-touch.Droplet impact on a superhydrophobic cylinder differs from that on a flat surface. After bouncing, once re-touch takes place, the contact time τc would increase, which is unfavorable for some applications. The increased τc may strongly depend on the Weber number and radius ratio, R*, of cylinder to droplet.The impact is investigated via lattice Boltzmann method simulations. The particular emphasis is placed on re-touch rebound patterns and τc.Rebound patterns and τc both strongly depend on a combined parameter, α=We/R*, characterizing the asymmetry of droplet spreading and retraction. As α increases, upward rebound and stretched breakup take place sequentially for the first bouncing, whereas rebound patterns change as intact re-touch rebound and separate re-touch rebound for the second bouncing. Increasing α enhances the asymmetry, which promotes the first rebound, thereby reducing τc regardless of rebound patterns. The enhanced asymmetry also accelerates rebound and thus reduces τc in the separate re-touch rebound regime, whereas it hinders rebound, leading to a significantly increased τc. The power-law correlations of τc vs α are developed for the first and second bouncing. Besides, a method is proposed to suppress or prevent the re-touch, which is proven to effectively reduce τc.Download : Download high-res image (155KB)Download : Download full-size image
engineering, chemical