Optical and photoelectrocatalytic performance of Tin (II) oxide silicate (Sn 6 SiO 8 ) thin films as a photoanode by Aerosol Assisted Chemical Vapor Deposition

Rabia Naeem,Khadija Munawar,Sehar Shakir,Rabia Sattar,Muhammad Adil Mansoor
DOI: https://doi.org/10.1016/j.optmat.2024.114960
IF: 3.754
2024-01-27
Optical Materials
Abstract:Developing a highly active, cost-effective, environmentally benign and stable photocatalyst for solar hydrogen production is challenging. In the present study, Tin (II) oxide silicate (Sn 6 SiO 8 ) thin films are deposited on FTO coated glass substrate from precursor [bis(trimethylsilanolato)tin], Sn 6 O 4 (OSiMe 3 ) 4 compound by AACVD technique at 550 and 500 ° C. Fabricated thin films were then physically analyzed by XRD, Raman, XPS , SEM, and EDX analysis to verify the formation of Sn 6 SiO 8 in granular and compact morphology respectively, the optical band gap of 2.48 and 2.40 eV were recorded by UV–Visible spectrophotometry. Photoelectrocatalytic response of the Sn 6 SiO 8 electrode proved that it is the n-type semiconductor and, therefore exhibits higher photocurrent of 3.79 and 3.13 mA/cm 2 at +0.71 V versus Ag/AgCl was found for the photoelectrode deposited at 550 and 500 °C which led to better stability for 1200 s.
materials science, multidisciplinary,optics
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