Effects of precursor pre-treatment on the vapor deposition of WS2 monolayers

H. Yang,Yumeng Shi,Dechao Geng,M. Pam,Jiadong Dan,S. Pennycook,Shaozhuan Huang,Junping Hu,L. Ang,Xue Gong,Xiaoxu Zhao
DOI: https://doi.org/10.1039/c8na00212f
IF: 5.598
2018-11-05
Nanoscale Advances
Abstract:Transition metal oxide powders have been widely used as the growth precursors for monolayer transition metal dichalcogenides (TMDCs) in chemical vapor deposition (CVD). It has been proposed that metal oxide precursors in the gas phase undergo a two-step reaction during CVD growth, where transition metal sub-oxides are likely formed first and then the sulfurization of these sub-oxides leads to the formation of TMDCs. However, the effects of stoichiometry of transition metal oxide precursors on the growth of TMDC monolayers have not been studied yet. In this contribution, we report the critical role of the WO3 precursor pre-annealing process on the growth of WS2 monolayers. Besides, several WO3 precursors with different types of oxygen vacancies have also been prepared and investigated by X-ray powder diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and density functional theory calculation. Among all the non-stoichiometric WO3 precursors, thermally annealed WO3 powder exhibits the highest oxygen vacancy concentration and produces WS2 monolayers with significantly improved quality in terms of lateral size, density, and crystallinity. Our comprehensive study suggests that the chemical composition of transition metal oxide precursors would be fundamentally critical for the growth of large-area and high-quality WS2 monolayers, which further pave the way for revealing their intrinsic properties and unique applications.
Chemistry,Medicine,Materials Science
What problem does this paper attempt to address?
The paper attempts to address the issue of how the chemical composition of tungsten trioxide (WO₃) precursors affects the quality, morphology, and optical properties of tungsten disulfide (WS₂) monolayer films during the chemical vapor deposition (CVD) process. Specifically, it investigates how WO₃ precursors with different oxygen vacancy concentrations, through pretreatments such as thermal annealing and plasma treatment, influence the growth of WS₂ monolayer films. The study found that thermally annealed WO₃ precursors with high oxygen vacancy concentrations can produce WS₂ monolayer films of higher quality, larger size, and better crystallinity. This finding provides important insights for further revealing the intrinsic properties of WS₂ monolayer films and their applications in optoelectronic and electronic devices.