CVD Controlled Growth of Large-Scale WS2 Monolayers

Zhuhua Xu,Yanfei Lv,Jingzhou Li,Feng Huang,Pengbo Nie,Siwei Zhang,Shichao Zhao,Shixi Zhao,Guodan Wei
DOI: https://doi.org/10.1039/c9ra06219j
IF: 4.036
2019-01-01
RSC Advances
Abstract:Monolayer tungsten disulfide (WS2) with a direct band gap of ca. 2.0 eV and stable properties has been a hotspot in two-dimensional (2D) nanoelectronics and optoelectronics. However, it remains challenging to successfully prepare monolayer WS2. In this paper, we report the chemical vapor deposition (CVD) growth behavior of hexagonal WS2 monolayers by using WS2 powders and sodium triosulfate (Na2S2O3) as precursors. We observed the Na2S2O3 has a significant effect on the WS2 triangular and leaf-like shapes. In addition, based on proposed S-termination and W-termination theory, the growth mechanisms for different shapes of WS2 were discussed.
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