Self-stacking two-layer conductive films for enhanced oxidation and low electrical resistance from hybrid ink of cobalt/copper

Ryota Sakaida,Hideya Kawasaki
DOI: https://doi.org/10.1016/j.matlet.2024.136238
IF: 3
2024-03-04
Materials Letters
Abstract:Present study developed a hybrid ink comprising sub-10 nm Cu nanoparticles and a cobalt- N, N-dimethyl-1,3-propanediamine complex, enabling the fabrication of Co-Cu films with excellent conductivity (7.8 μΩ·cm). The films exhibit a unique self-stacking two-layer structure, effectively preventing Cu oxidation during sintering. Remarkably, these Co-Cu films demonstrate outstanding durability, with only a 16 % increase in resistivity after a one-week high-temperature/humidity test (85 °C/85 % RH). Strong adhesion to glass substrates, without additional treatments, enhances their suitability for diverse electronic applications.
materials science, multidisciplinary,physics, applied
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