Unraveling the Wake-Up Mechanism in Ultrathin Ferroelectric Hf$_{\text{0}.\text{5}}$Zr$_{\text{0}.\text{5}}$O$_{\text{2}}$: Interfacial Layer Soft Breakdown and Physical Modeling

Chen-Yi Cho,Tzu-Yi Chao,Tzu-Yao Lin,I-Ting Wang,Sourav De,Yu-Sheng Chen,Yi-Ching Ong,Yu-De Lin,Po-Chun Yeh,Tuo-Hung Hou
DOI: https://doi.org/10.1109/ted.2024.3379473
IF: 3.1
2024-01-01
IEEE Transactions on Electron Devices
Abstract:This article proposes a new mechanism, referred to as interfacial-layer soft breakdown (IL-SBD), to elucidate the intricate wake-up process in the ultrathin ferroelectric (FE) hafnium–zirconium oxide (HZO). Our study provides a comprehensive interpretation and compelling experimental evidence, highlighting the crucial role of the interfacial layer (IL) and its soft breakdown in the wake-up phenomenon. A multidomain FE wake-up model is developed, incorporating defect generation, trap-assisted tunneling (TAT) within the IL, and charge screening at the IL/HZO interface, validating the proposed mechanism. The model accurately reproduces the trend of thickness-dependent wake-up behavior and reveals additional variability induced by the wake-up process, emphasizing the utmost significance of minimizing the IL in ultrathin HZO devices.
engineering, electrical & electronic,physics, applied
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