Effects of porosity on the structural and optoelectronic properties of Er-doped Ga2O3 epitaxial films on etched epi-GaN/sapphire substrates

Xiaokun Yang,Xuejian Du,Jie Liu,Rongrong Chen,Di Wang,Yong Le,Hongyan Zhu,Bo Feng,Jin Ma,Hongdi Xiao
DOI: https://doi.org/10.1016/j.ceramint.2020.12.096
IF: 5.532
2021-04-01
Ceramics International
Abstract:<p>The nanoporous (NP) GaN wafers which were fabricated by electrochemical etching (EC) method were used as substrates to deposit Er-doped Ga<sub>2</sub>O<sub>3</sub> epitaxial films by pulsed layer deposition (PLD). The epitaxial relationship between the GaN and Er doped β-Ga<sub>2</sub>O<sub>3</sub> film was Ga<sub>2</sub>O<sub>3</sub> (−201) ‖ GaN (0001) with Ga<sub>2</sub>O<sub>3</sub> [010] ‖ GaN [-12-10]. Compared to the Er doped films on the epi-GaN wafers with the porosity of 0%, ~20% and ~60%, the β-Ga<sub>2</sub>O<sub>3</sub> film deposited on the wafer with a porosity of ~40%, which has an energy bandgap of ~4.89 eV, has the best crystal quality and optoelectronic properties. The performance enhancement should be due to improved crystalline quality as a result of the existence of nanopores in the etched substrates. The excellent properties of Er doped Ga<sub>2</sub>O<sub>3</sub> films indicated that the films have great potential to fabricate Ga<sub>2</sub>O<sub>3</sub> optoelectronic devices.</p>
materials science, ceramics
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