Eu-doped Lu2O3 epitaxial films with an embedded nanoporous GaN distributed Bragg reflectors

Jie Liu,Xiaokun Yang,Chongchong Zhao,Rongrong Chen,Caina Luan,Hongdi Xiao
DOI: https://doi.org/10.1016/j.ceramint.2021.04.284
IF: 5.532
2021-08-01
Ceramics International
Abstract:The GaN/nanoporous GaN (NP-GaN) distributed Bragg reflectors (DBRs) with high reflectivity (>95%) at specific wavelengths were designed and fabricated by an electrochemical (EC) etching technique, and then as-grown GaN and DBR were used to grow Eu-doped Lu2O3 high-quality films by Pulsed Laser Deposition (PLD) method. Structural analyses confirmed the thin film grown at 480 °C has highest crystalline quality. The epitaxial relationship between the film and substrate was determined as Lu2O3 (222) ∥ GaN (0002) with Lu2O3 [ 1 ‾ 10 ] ∥ GaN [ 1 ‾ 2 1 ‾ 0 ] . The photoluminescence (PL) intensity of the Eu-doped Lu2O3 film with an embedded DBR substrate was 3.4 times higher than for reference film on as-grown GaN, which should be attributed to in-coupling and out-coupling of the excitation and emission lights. The enhancement effects of light-coupling were explained by multiple reflection model. Hence, this strategy can be used to enhance the optical signal intensity of scintillators by embedding DBR substrates with proper Bragg wavelength.
materials science, ceramics
What problem does this paper attempt to address?