Spatially Graded Millimeter Sized Mo 1– x W x S 2 Monolayer Alloys: Synthesis and Memory Effect
Hao Yu,Hui Yan,Heng Li,Zhuocheng Li,Yanliu Bai,Hao Zhu,Shougen Yin
DOI: https://doi.org/10.1021/acsami.1c09176
2021-09-08
Abstract:The band gap engineering of two-dimensional (2D) transition metal dichacogenides (TMDs) could significantly broaden their applications, especially in electronics and optoelectronics. Alloying is a more effective approach to synthesize 2D ternary TMD materials with tunable bandgaps by regulating the compositions. Whether the alloying could induce memory effects is of interest as a scientific problem and worthy to be studied. A thermal evaporation-assisted chemical vapor deposition (CVD) method was proposed to grow millimeter size gradient alloyed monolayer Mo1–xWxS2. This method reveals a promising and universal methodology for the development of gradient alloyed TMDs because of the precise controlling of each precursor. The synthesized Mo1–xWxS2 monolayer crystal has a gradient composition with x ranging from 0.1 to 1. The W and Mo atoms homogeneously alloyed with random distribution in the Mo1–xWxS2 monolayer. As reported, the deep energy levels induced by sulfur vacancies can be effectively suppressed to shallow energy levels by alloying TMDs. The series distribution of the shallow energy levels in the band of the graded alloy semiconductor can act as multiple charge trapping states, which leads to obvious memory effects in the device. These results present a new opportunity for memory devices and related applications.The Supporting Information is available free of charge at https://pubs.acs.org/doi/10.1021/acsami.1c09176.SEM images of the precursor films, large-scale OM and SEM image of the alloy monolayer, OM images of the synthesized products using different precursor film thicknesses, AFM image and XPS of Mo1–xWxS2 alloy monolayer, high-resolution SEM image of the synthesized Mo1–xWxS2 alloy region, band gap of the Mo1–xWxS2 monolayer alloy as a function of W composition x, PL characterization of monolayer Mo1–xWxS2 alloy, optical micrographs of the representative memory device, Ids–Vg cyclic sweeps at 4 V drain bias, capacitance-voltage curves, and continuous Ids–Vds under different Vg cyclic sweeps (PDF)This article has not yet been cited by other publications.
materials science, multidisciplinary,nanoscience & nanotechnology