Low-defect-density SnSe 2 films nucleated via thin layer crystallization

S.A. Ponomarev,K.E. Zakhozev,D.L. Rogilo,A.K. Gutakovski,N.M. Kurus,K.A. Kokh,D.V. Sheglov,A.G. Milekhin,A.V. Latyshev
DOI: https://doi.org/10.1016/j.jcrysgro.2024.127615
IF: 1.8
2024-02-10
Journal of Crystal Growth
Abstract:We have studied the structural and morphological features of SnSe 2 films grown on Si(1 1 1) and Bi 2 Se 3 (0 0 0 1) surfaces in an in situ reflection electron microscope. On both substrates, the SnSe 2 growth started at 100 °C as an amorphous layer, and when thickness reached 1 nm, crystallized by raising the growth temperature to 250 °C without interruption of Sn and Se fluxes. The introduction of this growth-initiating stage has decreased the concentration of screw dislocations on films' surfaces to ∼18 and ∼2 μm −2 for the Si(1 1 1) and Bi 2 Se 3 (0 0 0 1) substrates, respectively. High-resolution transmission electron microscopy investigation has shown that the layered SnSe 2 film has a hexagonal lattice structure corresponding to the space group P3 ̄m1 (no. 164) with lattice parameters a = 0.38 nm and c = 0.62 nm. Raman spectroscopy has shown vibrational modes corresponding to the 1T-SnSe 2 phase. We have shown that the decrease in Se:Sn flux ratio switches growth mode from Frank—van der Merwe type SnSe 2 epitaxy to Volmer—Weber type nucleation of SnSe 3D islands.
materials science, multidisciplinary,physics, applied,crystallography
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