Pulsed electrophoretic deposition for surface silanization of anodized aluminum from a silane-ethanol-water suspension

Israel L.M. Gonçalves,Rafael A. Vinhosa,Denise S. de Freitas,Simone L.D.C. Brasil
DOI: https://doi.org/10.1016/j.surfcoat.2024.130456
IF: 4.865
2024-02-01
Surface and Coatings Technology
Abstract:Unlike the deposition of silica nanoparticles , the functionalization of a surface by silanization requires the condensation of precursors near the surface. Pulsed cathodic electrophoretic deposition (pulsed-CEPD) allows, through water reduction, such condensation by locally increasing pH on the cathode, and, simultaneously, a greater control of hydrogen formation. This is useful specially regarding dielectric materials . In this sense, pulsed-CEPD was used for the sealing and silanization of unsealed anodized AA2024 from a silane-ethanol-water suspension. Two pulse widths were evaluated and their impact on the deposition were verified by FTIR, XPS, and contact angle measurements. Additionally, electrochemical impedance spectroscopy (EIS) was performed to evaluate the sealing process and to verify possible changes caused by the application of the cathodic potential during film formation. The results indicate that pulsed-CEPD allows the silanization despite the high voltage demanded by anodized aluminum . The shorter pulse width provided the most hydrophobic surface . FTIR spectra displayed all distinctive bands of an organically functionalized silicate structure. A model of the coating's chemical structure is suggested based on XPS results. EIS results obtained over 168 h in NaCl 0.6 M show higher impedance moduli for specimens prepared by the shortest pulse width. Equivalent circuit models and their physical meaning are proposed. From the results, it is possible to observe that the shorter pulse width increased the impedance moduli, and, therefore, provided better protection against corrosion.
physics, applied,materials science, coatings & films
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