Abstract:Extensive technology scaling has not only increased the complexity of Integrated Circuit (IC) fabrication but also multiplied the challenges in the Design For Manufacturability (DFM) space. Among these challenges, detection of design weak-points, popularly known as `Lithographic Hotspots', has attracted substantial attention. Hotspots are certain patterns which exhibit a higher probability of causing defects due to complex design-process interactions. Identifying such patterns and fixing them in the design stage itself is imperative towards ensuring high yield. In the early days of hotspot detection, Pattern Matching (PM) based methods were proposed. While effective in identifying previously known patterns, these methods failed to identify Never-Seen-Before (NSB) hotspots. To address this drawback, Machine Learning (ML) based solutions were introduced. Over the last decade, we have witnessed a plethora of ML-based hotspot detection methods being developed, each slightly outperforming its predecessors in accuracy and false-alarm rates. In this paper, we critically analyze the ML-based hotspot detection literature and we highlight common misconceptions which are found therein. We also pinpoint the underlying reasons that have led to these misconceptions by dissecting the ICCAD-2012 benchmark dataset, which has largely guided the evolution of this area, and revealing its limitations. Furthermore, we propose an enhanced version of this benchmark dataset, which we deem more appropriate for accurately assessing hotspot detection methods. Finally, we offer our suggestions to improve the effectiveness of ML-based Hotspot Detection methods and demonstrate about 5X reduction in false-alarms in comparison to the state-of-the-art.

Hotspot-aware DSA Grouping and Mask Assignment

An Effective Layout Decomposition Method for DSA with Multiple Patterning in Contact-Hole Generation.

A Generation Solving Layout Decomposition Method for DSA-MP Hybrid Lithography

DSAR: DSA aware Routing with Simultaneous DSA Guiding Pattern and Double Patterning Assignment.

Concurrent Guiding Template Assignment and Redundant via Insertion for DSA-MP Hybrid Lithography

A Via/Contact Layout Decomposition Method for Directed Self-Assembly Based on Local Optimization

Machine Learning-Based Hotspot Detection: Fallacies, Pitfalls and Marching Orders

Layout Decomposition For Hybrid E-Beam And Dsa Double Patterning Lithography

DSA-aware multiple patterning for the manufacturing of vias: Connections to graph coloring problems, IP formulations, and numerical experiments

Hotspot Detection Via Attention-Based Deep Layout Metric Learning

A Multi-Objective Layout Decomposition Framework for Self-Aligned Double Patterning Lithography

Bridging the Gap Between Layout Pattern Sampling and Hotspot Detection via Batch Active Learning

Litho-GPA: Gaussian Process Assurance for Lithography Hotspot Detection

Lithography Hotspot Detection Using a Double Inception Module Architecture

Modified Deep Learning Approach for Layout Hotspot Detection

Lithography Hotspot Detection and Mitigation in Nanometer VLSI

Creation and Fixing of Lithography Hotspots with Synopsys Tools

SAT Based Multi-Net Rip-Up-and-reroute for Manufacturing Hotspot Removal

Machine Learning Based Lithography Hotspot Detection with Sparse Feature Encoding and Hierarchical Pattern Classification

Adversarial Sample Generation for Lithography Hotspot Detection.

Semisupervised Hotspot Detection with Self-Paced Multitask Learning