Abstract:With the advancement of very large scale integrated circuits (VLSI) technology nodes, lithographic hotspots become a serious problem that affects manufacture yield. Lithography hotspot detection at the post-OPC stage is imperative to check potential circuit failures when transferring designed patterns onto silicon wafers. Although conventional lithography hotspot detection methods, such as machine learning, have gained satisfactory performance, with the extreme scaling of transistor feature size and layout patterns growing in complexity, conventional methodologies may suffer from performance degradation. For example, manual or ad hoc feature extraction in a machine learning framework may lose important information when predicting potential errors in ultra-large-scale integrated circuit masks. We present a deep convolutional neural network (CNN) that targets representative feature learning in lithography hotspot detection. We carefully analyze the impact and effectiveness of different CNN hyperparameters, through which a hotspot-detection-oriented neural network model is established. Because hotspot patterns are always in the minority in VLSI mask design, the training dataset is highly imbalanced. In this situation, a neural network is no longer reliable, because a trained model with high classification accuracy may still suffer from a high number of false negative results (missing hotspots), which is fatal in hotspot detection problems. To address the imbalance problem, we further apply hotspot upsampling and random-mirror flipping before training the network. Experimental results show that our proposed neural network model achieves comparable or better performance on the ICCAD 2012 contest benchmark compared to state-of-the-art hotspot detectors based on deep or representative machine leaning.

Litho-GPA: Gaussian Process Assurance for Lithography Hotspot Detection

Lithographic Hotspot Detection Based on SVM and Genetic Algorithm

Lithography Hotspot Detection Based on Heterogeneous Federated Learning with Local Adaptation and Feature Selection

Lithography Hotspot Detection Via Heterogeneous Federated Learning with Local Adaptation

Accurate Lithography Hotspot Detection Based on PCA-SVM Classifier with Hierarchical Data Clustering

Machine Learning Based Lithography Hotspot Detection with Sparse Feature Encoding and Hierarchical Pattern Classification

Lithography Hotspot Detection and Mitigation in Nanometer VLSI

Lithography Hotspot Detection Using a Double Inception Module Architecture

Spatial Batch Optimal Design Based on Self-Learning Gaussian Process Models for LPCVD Processes

Development of Convolutional Neural Network Based Gaussian Process Regression to Construct a Novel Probabilistic Virtual Metrology in Multi-Stage Semiconductor Processes

Imbalance aware lithography hotspot detection: a deep learning approach

Gaussian Process Regression Approach for Robust Design and Yield Enhancement of Self-Assembled Nanostructures

Application of Gaussian Processes with Variable Shrinkage Method and Just-in-time Modeling in the Semiconductor Industry

LithoHoD: A Litho Simulator-Powered Framework for IC Layout Hotspot Detection

Lithography Hotspot Detection Method Based on Transfer Learning Using Pre-Trained Deep Convolutional Neural Network

Bridging the Gap Between Layout Pattern Sampling and Hotspot Detection via Batch Active Learning

Mining Lithography Hotspots from Massive SEM Images Using Machine Learning Model

Hotspot Detection Via Attention-Based Deep Layout Metric Learning

Semisupervised Hotspot Detection with Self-Paced Multitask Learning

Adversarial Sample Generation for Lithography Hotspot Detection.

LithoGAN