Lithographic Hotspot Detection Based on SVM and Genetic Algorithm

CAO Kui-kang,SHEN Hai-bin,YANG Yi-wei
DOI: https://doi.org/10.3785/j.issn.1008-9497.2011.01.011
2011-01-01
Abstract:A lithography hotspot detection method based on support vector machine(SVM) and genetic algorithm(GA) is proposed.Frequency domain features of integrated circuit(IC) layout samples are first extracted with discrete cosine transformation.Then SVM classifiers are trained with the layout samples so that it can be used for hotspot detection.To improve the precision and efficiency of this method,genetic algorithm is used for feature selection and SVM parameter optimization.Experiment results show that the proposed method can improve the precision of lithography hotspot detection effectively.
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