Controlling contact resistance in top-gate polythiophene-based field-effect transistors by molecular engineering

Yong-Young Noh,Xiaoyang Cheng,Marta Tello,Mi-Jung Lee,Henning Sirringhaus
DOI: https://doi.org/10.1088/0268-1242/26/3/034003
IF: 2.048
2011-02-14
Semiconductor Science and Technology
Abstract:We report on an effective control of source?drain contact resistance by insertion of a self-assembled monolayer at the metal/semiconductor interface in top-gate staggered polymer field-effect transistors fabricated with poly(2,5-bis(3-tetradecylthiophene-2-yl)thieno[3,2-b]thiophene) (pBTTT). The device performance can be dramatically improved by introducing a fluorinated alkyl-thiol, 1H, 1H, 2H, 2H-perflourodecanethiol (PFDT) on the gold source?drain contacts. The PFDT-induced interface dipole and hydrophobic surface enables both a favourable shift of work function lowering the hole injection barrier via dipole alignment and a large crystal growth of pBTTT film with a unique lamellar morphology near to the contact. The optimized device with PFDT-modified gold contact plus OTS-treated substrate exhibits a high field-effect mobility above 0.4 cm2 V?1 s?1 and low contact resistance of 0.45 M? at the gate voltage of ?60 V.
engineering, electrical & electronic,materials science, multidisciplinary,physics, condensed matter
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