Structure and physical properties of multicomponent films based on the Fe-Si-B system

V. F. Bashev,O. I. Kushnerov,N. O. Kutseva,S. I. Ryabtsev
DOI: https://doi.org/10.1080/15421406.2024.2353962
IF: 0.7
2024-05-21
Molecular Crystals and Liquid Crystals
Abstract:The influence of modernized three-electrode ion-plasma sputtering of a complex Fe–Si–B– (Cu, Nb)/(Ni, Mo) target on the structure and properties of sputtered films was studied. The formation of amorphous and nanocrystalline phases in Fe 73 Si 15.8 B 7.2 -(Cu, Nb) 4 and Fe 78.5 Si 6 B 14 -(Ni, Mo) 1.5 films with a coherent scattering region size of 1.6 nm and 12 nm, respectively, was established as a result of a modernized three-electrode ion - plasma sputtering. The thermal stability of metastable states of films as well as electrical and magnetic properties of freshly prepared and heat-treated films has been investigated. The conditions for obtaining films with low values of the temperature coefficient of electrical resistance (−0.9∙10 −5 K −1 ) and coercive force (H C ∼11 A/m) have been determined.
chemistry, multidisciplinary,materials science,crystallography
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