Study of curtaining effect reduction methods in Inconel 718 using a plasma focused ion beam

F. Jaime,S. Desbief,J. Silvent,G. Goupil,M. Bernacki,N. Bozzolo,A. Nicolaÿ
DOI: https://doi.org/10.1111/jmi.13320
IF: 1.9522
2024-05-19
Journal of Microscopy
Abstract:The curtaining effect is a common challenge in focused ion beam (FIB) surface preparation. This study investigates methods to reduce this effect during plasma FIB milling of Inconel 718 (nickel‐based superalloy). Platinum deposition, silicon mask and XeF2 gas injection were explored as potential solutions. These methods were evaluated for two ion beam current conditions; a high ion beam intensity condition (30 kV–1 μA) and a medium one (30 kV–100 nA) and their impact on curtaining reduction and resulting cross‐section quality was assessed quantitatively thanks to topographic measurements done by atomic force microscopy (AFM). XeF2 assistance notably improved cross‐section quality at medium current level. Pt deposition and Si mask individually mitigated the curtaining effect, with greater efficacy at 100 nA. Both methods also contributed to reducing cross‐section curvature, with the Si mask outperforming Pt deposition. However, combining Pt deposition and Si mask with XeF2 injection led to deterioration of these protective layers and the reappearance of the curtaining effect after a quite short exposure time.
microscopy
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