Silicon-assisted growth of hexagonal boron nitride to improve oxidation resistance of germanium

Chao Zhang,Boxiang Gao,Yihua Ran,Zhiyuan Shi,Hongyan Zhu,Hui Zhang,Jian Liu,Bo Yang,Zhi Liu,Tianru Wu,Xiaoming Xie
DOI: https://doi.org/10.1088/2053-1583/ac0298
IF: 6.861
2021-05-28
2D Materials
Abstract:Abstract Hexagonal boron nitride (h-BN) is an exciting two dimensional dielectric due to its atomic flatness, free of dangling bonds, exceptional thermal and chemical stabilities. Here we report a method of silicon-assisted synthesis of monolayer h-BN on germanium (Ge) by chemical vapor deposition. The silicon atoms dissolve into Ge (110) and promote the growth of h-BN domains by formation of Si–N bonds. The oxidation dynamic shows that monolayer h-BN film is a high-performance passivation layer, preserving Ge from oxidation in air at high temperature. This work sheds lights on the outstanding oxidation resistance of h-BN for further Ge-based electronic devices.
materials science, multidisciplinary
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