Effect of indium doping on zinc oxide films prepared by chemical spray pyrolysis technique

Girjesh Singh,S. B. Shrivastava,Deepti Jain,Swati Pandya,T. Shripathi,V. Ganesan
DOI: https://doi.org/10.1007/s12034-010-0089-6
IF: 1.878
2010-10-01
Bulletin of Materials Science
Abstract:We report the conducting and transparent In doped ZnO films fabricated by a homemade chemical spray pyrolysis system (CSPT). The effect of In concentration on the structural, morphological, electrical and optical properties have been studied. These films are found to show (0 0 2) preferential growth at low indium concentrations. An increase in In concentration causes a decrease in crystalline quality of films as confirmed by X-ray diffraction technique which leads to the introduction of defects in ZnO. Indium doping also significantly increased the electron concentrations, making the films heavily n type. However, the crystallinity and surface roughness of the films decreases with increase in indium doping content likely as a result of the formation of smaller grain size, which is clearly displayed in AFM images. Typical optical transmittance values in the order of (80%) were obtained for all films. The lowest resistivity value of 0.045 Ω-m was obtained for film with 5% indium doping.
materials science, multidisciplinary
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