Density gradient segregation of Cu at the Si 2 Hf/Al interface in an Al-Si-Cu-Hf alloy

Zhihong Jia,Yuan Xing,Yaru Ning,Lipeng Ding,F.J.H. Ehlers,Longlong Hao,Qing Liu

DOI: https://doi.org/10.1016/j.scriptamat.2022.115022

IF: 6.302

2022-09-02

Scripta Materialia

Abstract:Solute segregation at the Si 2 Hf/Al interface of an Al-Si-Cu-Hf alloy was investigated by combining high angle annular dark-field scanning transmission electron microscopy (HAADF-STEM), energy dispersive X-ray spectroscopy (EDS) and density functional theory (DFT) calculation. Density gradient segregation of Cu atoms was observed at the habit plane of the nanobelt-like Si 2 Hf phase, with the Cu concentrations gradually increasing to the Si 2 Hf/Al interface. This gradient segregation of Cu is found to be beneficial for decreasing both the strain and interfacial energies and thereby promoting the stabilization of the Si 2 Hf precipitates during heat treatment. This study provides an insight into the enhanced stability of Si 2 Hf precipitates in Al-Si-Cu-Hf alloy.

materials science, multidisciplinary,nanoscience & nanotechnology,metallurgy & metallurgical engineering