Interface Design Beyond Epitaxy: Oxide Heterostructures Comprising Symmetry‐forbidden Interfaces

Hongguang Wang,Varun Harbola,Yu‐Jung Wu,Peter A. van Aken,Jochen Mannhart
DOI: https://doi.org/10.1002/adma.202405065
IF: 29.4
2024-06-06
Advanced Materials
Abstract:Epitaxial growth of thin‐film heterostructures is generally considered the most successful procedure to obtain interfaces of excellent structural and electronic quality between three‐dimensional materials. However, these interfaces can only join material systems with crystal lattices of matching symmetries and lattice constants. We present a novel category of interfaces, the fabrication of which is membrane‐based and does not require epitaxial growth. These interfaces therefore overcome limitations imposed by epitaxy. Leveraging the additional degrees of freedom gained, we demonstrate atomically clean interfaces between three‐fold symmetric sapphire and four‐fold symmetric SrTiO3. Atomic‐resolution imaging reveals structurally well‐defined interfaces with a novel moiré‐type reconstruction. This article is protected by copyright. All rights reserved
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
What problem does this paper attempt to address?