Photoelectric characteristic of single-phase InxGa1-xN films with tunable bandgap through RF magnetron sputtering

Ziyuan Li,Longhai Shen,Ouxiang Zhou,Xiaotian Zhu,Yu Zhang,Quhui Wang,Dongli Qi,Xinglai Zhang,Mengyao Han,Junhao Xu,Ye Chen,Yuhao Li
DOI: https://doi.org/10.1007/s10853-024-10434-9
IF: 4.5
2024-12-04
Journal of Materials Science
Abstract:In x Ga 1- x N films with tunable bandgap hold significant potential for photoelectric applications, particularly in wavelength-selective and UV–visible photodetection. Herein, a unique target was designed to prepare bandgap-tunable In x Ga 1- x N films by RF (radio frequency) magnetron sputtering. By adjusting the RF power to change the In content ( x value), we prepared In x Ga 1- x N films with bandgap variations in the range of 2.15–2.63 eV. Upon further investigation, it was found that the grown In x Ga 1- x N films had hexagonal structure and did not undergo phase separation in the In-rich composition. With the increase of In content from 0.46 to 0.60, the preferred orientation of the In x Ga 1- x N films changed from (101) to (100) plane, while the surface morphology of the In x Ga 1- x N films changed from worm-like to spherical grains. Photoluminescence peaks of In x Ga 1- x N films was composed of intrinsic and defect luminescence. Under irradiation of 450 and 650 nm laser, the responsivity of the In x Ga 1- x N metal–semiconductor-metal photodetector can reach 5.15 × 10 −7 and 3.2 × 10 −7 A/W, and the fastest response time can reach 1.28 and 1.32 s, respectively.
materials science, multidisciplinary
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