Pressure induced metallization with absence of structural transition in layered MoSe2

Zhao Zhao,Haijun Zhang,Hongtao Yuan,Shibing Wang,Yu Lin,Qiaoshi Zeng,Gang Xu,Zhenxian Liu,G. K. Solanki,K. D. Patel,Yi Cui,Harold Y. Hwang,Wendy L. Mao
DOI: https://doi.org/10.48550/arXiv.1504.08077
2015-04-30
Materials Science
Abstract:Layered transition-metal dichalcogenides have emerged as exciting material systems with atomically thin geometries and unique electronic properties. Pressure is a powerful tool for continuously tuning their crystal and electronic structures away from the pristine states. Here, we systematically investigated the pressurized behavior of MoSe2 up to ~ 60 GPa using multiple experimental techniques and ab -initio calculations. MoSe2 evolves from an anisotropic two-dimensional layered network to a three-dimensional structure without a structural transition, which is a complete contrast to MoS2. The role of the chalcogenide anions in stabilizing different layered patterns is underscored by our layer sliding calculations. MoSe2 possesses highly tunable transport properties under pressure, determined by the gradual narrowing of its band-gap followed by metallization. The continuous tuning of its electronic structure and band-gap in the range of visible light to infrared suggest possible energy-variable optoelectronics applications in pressurized transition-metal dichalcogenides.
What problem does this paper attempt to address?