Demonstration of scaling and monolithic stacking for higher integration of integrated circuit using c-axis aligned crystalline oxide semiconductor FET

Hiromi Sawai,Motomu Kurata,Tsutomu Murakawa,Yoshinori Ando,Kunihiro Fukushima,Ryota Eto,Shinya Sasagawa,Kentaro Sugaya,Ryota Hodo,Toshiki Mizuguchi,Yusuke Komura,Hitoshi Kunitake,Shinichi Takagi,Shunpei Yamazaki
DOI: https://doi.org/10.35848/1347-4065/ad3ab7
IF: 1.5
2024-05-04
Japanese Journal of Applied Physics
Abstract:C-axis-aligned crystalline oxide semiconductor (CAAC-OS) FETs exhibit extremely low off-state leakage current and thus are suitable for low-power devices. Furthermore, CAAC-OS FETs can be integrated in the back end of line process and are promising as memory devices. For higher integration using the CAAC-OS FETs, we examined scaling and monolithic stacking. In addition, we present a 3D dynamic random access memory prototype, which is formed using three-layer monolithically stacked CAAC-OS FETs on a Si-CMOS and exhibits long-term data retention owing to the ultralow off-leakage current. These techniques will contribute to higher speed and integration of memory devices.
physics, applied
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