Abstract:Graphene offers exceptional properties, such as ultra-high carrier mobility, near-ballistic transport characteristics, and ultra-high-frequency operational response, making it an ideal material for radio-frequency devices and high-speed optical communications. To realize its potential applications, high-quality graphene films must be integrated onto target substrates with reliability, uniformity, and scalability. Despite significant progress in the chemical vapor deposition of high-quality graphene on catalytic metal substrates, the transfer of such films onto application-targeted substrates remains necessary for large-scale technological use, but it faces challenges like contaminations and cracks. Graphene's flexibility and single-atom thickness make it vulnerable to damage and folding during the transfer process due to force disturbances and uneven force distribution. Traditional graphene transfer methods employ organic polymers as a medium and remove them using organic solvents after transferring graphene onto the desired substrates. However, this repetitive process generates organic waste and leaves unavoidable contamination due to the limited solubility of the polymer. Furthermore, selective interlacing of organic solvents during polymer removal can detach graphene from the substrate and cause cracks. In this study, we demonstrate a novel approach to address these issues. Instead of using organic polymers, we directly use the photoresist as the transfer medium to mechanically delaminate graphene from the metal growth substrate onto the targeted substrate. By doing so, we eliminate the need for repeated polymer coating on the graphene surface, enabling successful transfer without crack formation, wrinkles, or unintentional doping. The strong interaction between graphene and the photoresist, coupled with the weakened interaction between graphene and the growth substrate due to oxidation, ensures crack-free delamination. Moreover, the photoresist serves as a patterned mask plate for exposure, etching, and other subsequent device fabrication processes. As a result, the electrical properties of graphene are improved, achieving an average carrier mobility of 6200 cm(2)center dot V-1 center dot s(-1). This integrated approach not only enhances the device performance of two-dimensional materials but also paves the way for future applications of such materials in electronics and photonics. In conclusion, our method offers a promising solution for the successful transfer and device fabrication of graphene, enhancing its potential in the field of electronics and photonics.

Integrated wafer-scale ultra-flat graphene by gradient surface energy modulation

Large-area transfer of two-dimensional materials free of cracks, contamination and wrinkles via controllable conformal contact

Polyacrylonitrile as an Efficient Transfer Medium for Wafer-Scale Transfer of Graphene

Toward Direct Growth of Ultra‐Flat Graphene

Transfer-Free Quasi-Suspended Graphene Grown on a Si Wafer.

Wafer-Scale Graphene Growth on Si/SiO 2 Substrates via Metal-Free Chemical Vapor Deposition

Wafer-scale synthesis and transfer of monolayer graphene

Batch Synthesis of Transfer-Free Graphene with Wafer-Scale Uniformity

Scalable and ultrafast epitaxial growth of single-crystal graphene wafers for electrically tunable liquid-crystal microlens arrays

Synthesis of Wafer‐Scale Graphene with Chemical Vapor Deposition for Electronic Device Applications

Transfer-Free CVD Growth of High-Quality Wafer-Scale Graphene at 300 °C for Device Mass Fabrication.

Wafer-scale Graphene Electro-absorption Modulators Fabricated in a 300mm CMOS Platform

Rapid and Scalable Transfer of Large‐area Graphene Wafers

Stacking transfer of wafer-scale graphene-based van der Waals superlattices

Wafer bonding solution to epitaxial graphene - silicon integration

Crack-Free Transfer of Graphene Wafers Via Photoresist As Transfer Medium

Graphene-enabled, directed nanomaterial placement from solution for large-scale device integration

Assessment of wafer-level transfer techniques of graphene with respect to semiconductor industry requirements

Graphene‐Enhanced Metal Transfer Printing for Strong van der Waals Contacts between 3D Metals and 2D Semiconductors

Wafer-Scale Integration of Graphene-Based Electronic, Optoelectronic and Electroacoustic Devices

Autonomously Controlled Homogenous Growth of Wafer‐Sized High‐Quality Graphene Via a Smart Janus Substrate